Ferroelectronics Lab

Understanding and utilizing non-volatile properties of materials

  • About the Lab
  • People
  • Research
  • Publications
  • Outreach
  • Facilities
  • News
Home » New Publication! “Memristors Based on (Zr, Hf, Nb, Ta, Mo, W) High-Entropy Oxides”

New Publication! “Memristors Based on (Zr, Hf, Nb, Ta, Mo, W) High-Entropy Oxides”

September 2, 2021 By Matt Webb

Abstract:

“Memristors have emerged as transformative devices to enable neuromorphic and in-memory computing, where success requires the identification and development of materials that can overcome challenges in retention and device variability. Here, high-entropy oxide composed of Zr, Hf, Nb, Ta, Mo, and W oxides is first demonstrated as a switching material for valence change memory. This multielement oxide material provides uniform distribution and higher concentration of oxygen vacancies, limiting the stochastic behavior in resistive switching. (Zr, Hf, Nb, Ta, Mo, W) high-entropy-oxide-based memristors manifest the “cocktail effect,” exhibiting comparable retention with HfO2– or Ta2O5-based memristors while also demonstrating the gradual conductance modulation observed in WO3-based memristors. The electrical characterization of these high-entropy-oxide-based memristors demonstrates forming-free operation, low device and cycle variability, gradual conductance modulation, 6-bit operation, and long retention which are promising for neuromorphic applications.”

Full text available from: Advanced Electronic Materials

Share this:

  • Click to email a link to a friend (Opens in new window)
  • Click to print (Opens in new window)
  • Click to share on LinkedIn (Opens in new window)
  • Click to share on Twitter (Opens in new window)
  • Click to share on Facebook (Opens in new window)

Related

Filed Under: Publications

News

  • New Publication! “Composite Spin Hall Conductivity from Non-collinear Antiferromagnetic Order” May 4, 2023
  • New Publication! “Adaptive Magnetoactive Soft Composites for Modular and Reconfigurable Actuators” March 27, 2023
  • New Publication! “Geometric defects induced by strain relaxation in thin film oxide superlattices.” November 10, 2022

Subscribe to Blog via Email

Enter your email address to subscribe to this blog and receive notifications of new posts by email.

About

Our work is multidisciplinary. We employ concepts and tools from the fields of materials science, chemistry, physics and electrical engineering to develop new methods to investigate and engineer … Read More

News

New Publication! “Composite Spin Hall Conductivity from Non-collinear Antiferromagnetic Order”

May 4, 2023 By Matt Webb

New Publication! “Adaptive Magnetoactive Soft Composites for Modular and Reconfigurable Actuators”

March 27, 2023 By Matt Webb

Contact

Ferroelectronics Lab
Address: 2030 H.H. Dow

T: (734) 763-6914
E: [email protected]
  • Email

Ferroelectronics Lab · Copyright © 2023 · Website by Super Heron Support